The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2003

Filed:

Apr. 30, 2001
Applicant:
Inventor:

Kiyoshi Mori, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract

On the photo mask are drawn product patterns and mask dimension inspection marks to be arranged around the respective product patterns. Each of the mask dimension inspection marks includes a line pattern having a width equal to a line width of the product pattern. Further, each of the mask dimension inspection marks includes a reference pattern that is disposed adjacent to the line pattern. A width of the mask dimension inspection mark is wider than that of the line pattern.


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