The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2003
Filed:
Jul. 26, 2000
Applicant:
Inventor:
Steven G. Jordan, Fremont, CA (US);
Assignee:
AIWA Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/127 ;
U.S. Cl.
CPC ...
G11B 5/127 ;
Abstract
A process of chemical-mechanical contouring (CMC) using a stair-step etch involves formation of an elevated layer of substrate overlying a device, in the illustrative example a thin-film magnetic head. The elevated layer of substrate is formed into a stair-step structure with the height and width of the stair-steps selected to attain a predetermined shape and size.