The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2003

Filed:

Sep. 21, 2000
Applicant:
Inventor:

Todd K. Makishi, Harbor City, CA (US);

Assignee:

Northrop Grumman Corporation, Redondo Beach, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 ; B08B 5/04 ;
U.S. Cl.
CPC ...
B08B 3/02 ; B08B 5/04 ;
Abstract

Cleaning of MBE vacuum chambers of residue containing a volatile material, such as red phosphorus, is safely achieved by wetting the residue with de-ionized water ( ) and depositing the residue in a water bath, formed by the water at the bottom of the chamber, to form a slurry. The slurry is vacuumed ( & ) from the chamber and collected ( ) within the canister ( ) of the vacuum cleaner. The water precludes ignition of the red phosphorus during cleaning of the chamber and during collection within the canister of the vacuum cleaner.


Find Patent Forward Citations

Makishi, Todd. (2003). Method for cleaning hazardous waste from vacuum chambers in molecular beam epitaxy processing (U.S. Patent No. 6562143). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6562143

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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