The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2003
Filed:
Jun. 12, 2001
Applicant:
Inventors:
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/750 ;
U.S. Cl.
CPC ...
G06F 1/750 ;
Abstract
In a circuit pattern design method which uses a plurality of standard cells that optimize circuit patterns for function units on the basis of a logic description which describes circuit operation of a semiconductor device, and which method generates a circuit pattern corresponding to charged-particle beam exposure using both a character projection exposure method and a variable shaped beam exposure method, the circuit pattern satisfies a design constraint condition, and a predetermined condition imposed on transfer to a sample or imposed on an aperture mask used in exposure by the character projection exposure method.