The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2003
Filed:
Mar. 22, 2001
Masahiro Ohba, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A scan-exposure device is provided wherein light beams becoming out of focus due to temperature changes is prevented and focus adjustment can be easily carried out, when a recording medium is subjected to scan-exposure by a plurality of light sources. A stage of an exposing head having a plurality of light source units provided thereon is supported by bases disposed at longitudinal direction opposite end portions thereof, and bases move in a sub-scanning direction which is the longitudinal direction of the stage when driven by a sub-scanning motor. The bases move relatively, in proportion to expansion or contraction of the stage, thereby preventing deformation of the stage due to temperature changes so that dislocation does not occur and light beams emitted from the light source units do not become out of focus due to deformation of the stage.