The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2003
Filed:
Oct. 27, 2000
Applicant:
Inventors:
Assignee:
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 2/907 ;
U.S. Cl.
CPC ...
H01J 2/907 ;
Abstract
A shadow mask is composed of an iron-based alloy plate containing 31.0-38.0 weight % of nickel and 1.0-6.5 weight % of cobalt. The iron-based alloy has a crystal grain size number of 10 or more and 12 or less, has a crystal grain size of 50 &mgr;m or less in a cross section in a direction parallel and normal to a rolling direction of the iron-based alloy plate, and has an average crystal grain size of 30 &mgr;m or less in a cross section in a direction parallel to the rolling direction of the iron-based alloy plate.