The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2003
Filed:
Jun. 01, 2000
Hyo-Derk Park, Kyungki-do, KR;
Suk-Won Jung, Choongcheongnam-do, KR;
Kwang-Bum Park, Kyungki-do, KR;
In-Hoe Kim, Kyungki-do, KR;
Hyun-Chan Moon, Kyungki-do, KR;
Kun-Nyun Kim, Kyungki-do, KR;
Soon-Sup Park, Kyungki-do, KR;
Sang-Mo Shin, Kyungki-do, KR;
Korea Electronics Technology Institute, Kyungki-Do, KR;
Abstract
Disclosed is a microlens manufacturing method which comprises the step of: positioning a X-ray mask for manufacturing the microlens on an substrate on which a sensitive film is formed, and arranging a rotation axis of the substrate and a central axis of the X-ray mask; applying X-rays to the X-ray mask to expose the sensitive film while fixing the X-ray mask and rotating the substrate; developing the sensitive film to form the microlens; performing an electroplating process on the plating base to form a metal layer; and separating the metal layer from the sensitive film structure and combining the metal layer with a mold frame for injection molding the microlens and manufacturing an injection mold.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile