The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2003
Filed:
May. 31, 2000
Applicant:
Inventors:
Akihito Ishikawa, Allen, TX (US);
Tomoki Tanaka, Allen, TX (US);
Nobuo Takeda, Richardson, TX (US);
Masataka Yoshida, Tokyo, JP;
Assignee:
Ball Semiconductor, Inc., Allen, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 1/74 ; G03C 1/765 ; G03F 7/16 ; G03F 7/18 ; B05D 3/00 ; B05D 1/02 ; B05D 7/00 ;
U.S. Cl.
CPC ...
G03C 1/74 ; G03C 1/765 ; G03F 7/16 ; G03F 7/18 ; B05D 3/00 ; B05D 1/02 ; B05D 7/00 ;
Abstract
A system and method is disclosed for coating a conventional wafer or a spherical shaped semiconductor substrate with liquid material such as photoresist by utilizing a “drop on demand” piezo driven dispense nozzle, a bubble-jet dispense nozzle, or a continuous piezo jet with charging electrodes. The proposed system and method will greatly reduce, and in some cases virtually eliminate, the waste of photoresist in the process.