The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2003
Filed:
Dec. 14, 2001
Rempei Nakata, Kamakura, JP;
Nobuhide Yamada, Tokyo, JP;
Hideshi Miyajima, Yokohama, JP;
Akihiro Kojima, Yokohama, JP;
Takahiko Kurosawa, Goleta, CA (US);
Eiji Hayashi, Tsuchiura, JP;
Youngsoon Seo, Tsukuba, KR;
Atsushi Shiota, Tsukuba, JP;
Kinji Yamada, Tsukuba, JP;
Other;
Abstract
A method of forming an insulating film which includes the steps of: dissolving in a solvent a first and second polymer which each comprise methylpolysiloxane as the main component and one of which has a weight average molecular weight at least 10 times that of the other to thereby prepare a chemical solution; applying the chemical solution to a semiconductor substrate to form a coating film; and heat-treating the coating film to thereby form an organosilicon oxide film. The weight-average molecular weight of the first polymer is preferably at least 100 times that of the second polymer. Thus, an insulating organosilicon oxide film having a low dielectric constant and high cracking resistance is formed from a coating fluid.