The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2003
Filed:
Mar. 07, 2000
Hubert Burggraf, Oyten, DE;
Rolf Kettenburg, Oyten, DE;
Andreas Krupp, Langwedel, DE;
Dirk Maiwald, Weyhe, DE;
Dirk Rathjen, Bremen, DE;
STN Atlas Elektronik GmbH, Breman, DE;
Abstract
A system for measuring unevenness formed by grooves and/or long waves in a surface of an object by using a measuring platform. The system moves the object and the measuring platform relative to each other and projects from the measuring platform a light streak that extends in a direction of the movement onto a surface of the object at a fixed projection angle that is tilted relative to a surface normal of the surface. The light streak is reproduced on a planar, position-sensitive photo receiver with a plurality of successive instantaneous exposures of the photo receiver, where the photo receiver is fixedly arranged on the measuring platform with a recording angle that is tilted relative to the fixed projection angle. The system records the surface along the direction of the movement with a plurality of continuous light-streak images and determines a surface profile of the surface along the direction of the movement from deformations in the plurality of the light-streak images.