The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2003
Filed:
Nov. 02, 2001
Applicant:
Inventors:
Naiqian Han, Sunnyvale, CA (US);
Liji Huang, San Jose, CA (US);
Assignee:
Intpax, Inc., Cupertino, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 2/608 ; G02B 2/600 ; G02B 6/00 ;
U.S. Cl.
CPC ...
G02B 2/608 ; G02B 2/600 ; G02B 6/00 ;
Abstract
The present invention discloses an optimized optical attenuator device. It includes the design of resonator formed by two identical mirrors, which are made by MEMS process. The structure realizes the minimum insertion loss. The two membranes are chosen to be with high reflection rate. Multiple layer or metal layer or mixture of them can produce membrane of high reflection rate. High reflection rate causes low tuning voltage for one certain attenuation range.