The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2003
Filed:
Apr. 28, 2000
Nissin Electric Co., Ltd., Kyoto, JP;
Abstract
An ion implanting apparatus is provided with a control apparatus for controlling the filament current passing to the respective filaments in accordance with the beam current IB measured by a plurality of beam current measuring instruments The control apparatus performs, at least once respectively, {circle around (1)} the current value control routine which calculates average values of all beam current measured by the beam current measuring instruments and increases and decreases the respective filament current IF such that the average value comes near to the set value, and {circle around (2)} the uniformity control routine which groups the beam current measuring instruments into the number of the filaments, seeks for a maximum value and the minimum value from all the measured values of the beam current IB, decides groups to which the maximum value and the minimum value belong, decreases the filament current IF passing to the filaments corresponding to the maximum value, and increases the filament current IF passing to the filaments corresponding to the minimum value.