The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2003
Filed:
Apr. 11, 2000
Other;
Abstract
There is described a semiconductor manufacturing apparatus for coating the surface of a semiconductor wafer with an organic coating, such as anti-reflective coating, which shortens a down time required in association with removal of compounds that tend to sublime and enables simplification of removal of the compounds and an increase in safety of the removal operation. A top plate of a hot plate unit for heating a semiconductor wafer is formed from light-transmissive material such as quartz. A light source unit for illuminating UV-rays effective for decomposing organic compounds is disposed on the top plate. The hot plate unit bakes the semiconductor wafer coated with the organic material, and compounds that have a tendency to sublime including organic material adhere to the lower surface of the top plate in association with the baking operation. Every time a predetermined number of semiconductor wafers have been processed by the hot plate unit, the light source unit radiates UV-rays onto the compounds adhering to the top plate.