The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2003
Filed:
Aug. 30, 2000
Takeshi Obana, Hitachi, JP;
Kunio Miyazaki, Hitachi, JP;
Hisanori Okamura, Tokai, JP;
Takeshi Tsukamoto, Hitachi, JP;
Takahiko Kato, Hitachinaka, JP;
Masato Koshiishi, Takahagi, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
Provided are an underwater processing apparatus which can effectively prevent water from entering a shield for a workpiece having a surface ruggedness, and in which variation in a gas flow for a processing part is reduced, a processing method and an application thereof to a nuclear reactor, and the under water processing device is composed of a shield means which locally cover the processing part with the gas in order to prevent water from entering the shield member, the shield means having a solid wall formed of a member which is slidable in a part where it make contact with the workpiece, and adapted to make contact with the workpiece and to be moved up and down by a pressing force, and a water jetting means for forming a water curtain around the outer periphery of the solid wall.