The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2003

Filed:

Nov. 10, 1999
Applicant:
Inventors:

Hans Artmann, Magstadt, DE;

Wilhelm Frey, Palo Alto, CA (US);

Manfred Moellendorf, Leonberg, DE;

Assignee:

Robert Bosch GmbH, Stuttgart, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/130 ; H01L 2/146 ; H01L 2/1302 ;
U.S. Cl.
CPC ...
H01L 2/130 ; H01L 2/146 ; H01L 2/1302 ;
Abstract

A method for producing a thin film on a carrier substrate. For this purpose, a buried sacrificial layer is initially produced in the interior of a parent body, the buried sacrificial layer separating a layer from a residual body remaining from the parent body. After that, the carrier substrate is attached to the layer and the sacrificial layer is then removed. As a result, the thin film to be produced comes into being on the carrier substrate. The method is suitable for the production of electronic components or thin-film solar cells, the parent body being made up, for example, of monocrystalline silicon in which a sacrificial layer of porous silicon is produced.


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