The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2003
Filed:
May. 23, 2001
Applicant:
Inventor:
Wenhui Mei, Plano, TX (US);
Assignee:
Ball Semiconductor, Inc., Allen, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/772 ; G03B 2/742 ; G03F 9/00 ;
U.S. Cl.
CPC ...
G03B 2/772 ; G03B 2/742 ; G03F 9/00 ;
Abstract
A system for image-scanning a pixel-mask pattern onto a subject, such as a subject in digital photolithography, is provided. The system includes a pixel panel for generating a pixel pattern formed of pixel elements. A lens system positioned between the panel and the subject simultaneously directs the pixel elements to the subject. A mirror positioned between the panel and the subject enables the system to direct the pixel elements to a portion of the subject at any one time. A computing system may be used to generate the pixel elements and provide the pixel elements to the panel in a predetermined sequence.