The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2003
Filed:
Jan. 25, 2001
Peter R. Herman, Mississauga, Ontario, CA;
Robin Marjoribanks, Toronto, Ontario, CA;
Anton Oettl, Weissbach, DE;
Other;
Abstract
A method of laser processing or laser modification of materials. The combination of ultrafast laser pulses and high-repetition rate (>100 kHz) bursts (or continuous operation) defines a new and unexpected regime for material processing. The high repetition rate controls thermal and/or other relaxation processes evolving between each ultrafast laser pulse that 'prepares' the sample surface or bulk to alter the interaction with subsequent ultrafast laser pulses and thereby improve or optimize the process, or enable a new process, that are not available at lower repetition rate. The addition of this laser-controlled thermal component, and/or the general control of relaxation processes, overcomes several current limitations of ultrafast laser processing at lower repetition rates (<100 kHz), providing means to further harness the many attributes of ultrafast lasers for general material processing and material modification applications.