The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2003
Filed:
Sep. 10, 2001
Klaus-Peter Stengele, Pleiskirchen, DE;
Heinrich Giegrich, Waldkraiburg, DE;
Nigu Chemie GmbH, Waldkraiburg, DE;
Abstract
The invention relates to a method for the specific photolytic deprotection of nucleoside derivatives that are immobilized on a substrate, especially for use in the production of DNA chips. Said method is characterized in that a gel or viscous liquid layer is applied on the nucleoside derivatives that are immobilized on a substrate. Said gel or viscous liquid contains one or more polymer compounds and at least one representative from the group comprising water, water/C -C alcohol mixtures and polar aprotic solvents. For initiating the deprotection, the nucleoside derivates are irradiated. This method favors a rapid, clean and complete removal of the photolabile protective groups from the nucleoside derivatives, which results in the required purity of the synthesized nucleotide or oligonucleotide sequences.