The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2003
Filed:
Apr. 11, 2001
Sony Corporation, Tokyo, JP;
Abstract
In order to increase the recording capacity while preventing jitter deterioration and a decrease of the modulation factor and thereby ensuring satisfactory recording characteristics, a first dielectric film, phase recording film, second dielectric film, reflection film and protective film are sequentially formed on a disc substrate having formed lands, grooves and wobbling on one major surface. The recording film is made of a GeInSbTe alloy, and the reflection film is made of an AgPdCu alloy or AlCu alloy. Composition of the GeInSbTe alloy is adjusted to contain Ge in the range of 1 to 8 wt %, In in the range of 2 to 6 wt %, and control Sb/Te in the range of 2.2 to 3.0. Composition of the AgPdCu alloy is adjusted to contain Pd in the range of 0.9 to 1.5 wt % and Cu not more than 1.5 wt %. Composition of the AlCu alloy is adjusted to contain Cu in the not more than 1.5 wt %. Groove depth is controlled in the range of 35 to 45 nm, groove width in the range of 0.35 to 0.50 &mgr;m, thickness of the first dielectric film in the range of 75 to 95 nm, thickness of the recording film in the range of 12 to 20 nm, thickness of the second dielectric film in the range of 16 to 28 nm, and thickness of the reflection film in the range of 80 to 160 nm.