The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2003
Filed:
Mar. 30, 2001
Sony Corporation, Tokyo, JP;
Abstract
In order to ensure CAV recording/reproduction while preventing jitter deterioration and modulation decrease and thereby ensuring sufficient recording properties, even at a linear velocity higher than 4.8 m/s, a first dielectric film, phase change versatile recording film, second dielectric film, reflection film and protective film are formed on a disc substrate having formed lands and grooves on one major surface. The recording film is made of a GeInSbTe alloy, and the reflection film is made of an AgPdCu alloy or AlCu alloy. Composition of the GeInSbTe alloy is adjusted to contain Ge in the range of 1 to 6 wt %, In in the range of 2 to 6 wt %, and control Sb/Te in the range of 2.2 to 3.0. Composition of the AgPdCu alloy is adjusted to contain Cu not more than 1.5 wt %. Regarding groove conditions, groove depth is controlled in the range of 40 to 50 nm, groove width in the range of 0.40 to 0.65 &mgr;m, thickness of the first dielectric film in the range of 75 to 95 nm, thickness of the recording film in the range of 12 to 18 nm, thickness of the second dielectric film in the range of 20 to 28 nm, and thickness of the reflection film in the range of 60 to 140 nm.