The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2003
Filed:
Nov. 27, 2001
Haridasan K. Nair, Williamsville, NY (US);
Michael Van Der Puy, Amherst, NY (US);
David Nalewajek, West Seneca, NY (US);
Timothy R. Demmin, Grand Island, NY (US);
Andrew J. Poss, Kenmore, NY (US);
David E. Bradley, Buffalo, NY (US);
Ian R. Shankland, Randolph, NJ (US);
Martin E. Cheney, Buffalo, NY (US);
Honeywell International, Morristown, NJ (US);
Abstract
A process for preparing 1-chloro-1,1,3,3,3-pentafluoropropane, CF CH CF Cl, comprising contacting in a reaction zone in the substantial absence of oxygen, reactants comprising chlorine and 1,1,1,3,3-pentafluoropropane, CF CH CHF (also referred to as HFC-245fa), and subjecting the reactants to actinic radiation, such as UV light at about 2,000 to 4,000 Angstroms, wherein: (1) inert gas is present at a concentration equal to or less than about 5 wt. % of the total weight of reactants; (2) the molar ratio of chlorine to CF CH CHF is from about 0.2:1 to about 1.5:1; and (3) the concentration of chlorinated product produced having greater than one chlorine present in the molecule is less than or equal to about 10 wt. %.