The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6551442 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 22, 2003

Filed:

Jan. 23, 2001
Applicant:
Inventor:

Kojiro Yuzuriha, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/100 ;
U.S. Cl.
CPC ...
H01L 2/100 ;
Abstract

A method of producing a semiconductor device having a multilayered wiring conductors and a system for producing the same. The nonuniformity of SOG coating film effectively suppressed and various treatments are simple and less time-consuming. A wiring conductor is formed on a semiconductor substrate, and an insulating layer covering the wiring conductor and the semiconductor substrate is formed, and the insulating layer is then subjected to a wet etching prior to the formation of SOG layer, thereby to increase a wettabiltity by the coating solution on the insulating layer.


Find Patent Forward Citations

Yuzuriha, Kojiro. (2003). Method of producing semiconductor device and system for producing the same (U.S. Patent No. 6551442). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6551442

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