The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2003
Filed:
Jul. 26, 2001
Tetsuya Abe, Ibaraki-ken, JP;
Sadamitsu Tanzawa, Ibaraki-ken, JP;
Seiji Hiroki, Ibaraki-ken, JP;
Yoshinori Tajima, Tokyo, JP;
Takashi Futatsuki, Tokyo, JP;
Organo Corporation, Tokyo, JP;
Abstract
A discharge gas containing PFC gas including CF and NF generated from a manufacturing process ( ) is adsorbed at an adsorbing device ( ) and then desorbed using nitrogen as a purge gas. A desorbed gas with CF and NF concentrated can be obtained in this manner. The desorbed gas is then supplied to a chromatographic separator ( ) for chromatographic separation with nitrogen as a carrier gas. In this manner, CF and NF within the PFC gas can be separated. In particular, because the gas is once concentrated at the adsorbing device ( ), chromatographic separation of the gas constituents can be efficiently performed. By independently concentrating CF and NF obtained by the chromatographic separation, high purity gas constituents of the PFC gas can be obtained, and reused at the manufacturing process ( ).