The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2003
Filed:
May. 24, 2002
Clyde N. Richards, San Diego, CA (US);
Other;
Abstract
Effluent gas cleaning process and apparatus for effectively removing particulates in the 0.01 micron to 0.1 micron diameter range, and for removing water-soluble gaseous contaminants, by first bringing the effluent to a relatively high temperature and humidity in a first stage, and then exposing the effluent to copious quantities of small cool water droplets in a second stage, for particular combinations of: the first stage relative humidity; the first-to-second stage droplet temperature difference; the stage two water droplet mass flow rate vs. effluent flow rate; the second stage droplet size; the travel time of the effluent during exposure to the cool droplets; and the electrical charge state of the second stage water droplets and opposite charge state of the particulates. The combinations enhance effluent cleaning through the combined operation of up to four distinct physical processes which can be made to occur during the second stage.