The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2003
Filed:
Apr. 24, 2000
Applicant:
Inventor:
Kunal N. Taravade, Colorado Springs, CO (US);
Assignee:
LSI Logic Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/01 ; G02F 1/03 ; G02F 1/07 ; G02F 1/1335 ; G03B 2/754 ;
U.S. Cl.
CPC ...
G02F 1/01 ; G02F 1/03 ; G02F 1/07 ; G02F 1/1335 ; G03B 2/754 ;
Abstract
An intensity filter for deep UV lithography enhances contrast and also therefore increases the resolution of patterned images by passing only intensities that fall within a specific minimum threshold value, resulting in a more exact aerial image replicating the mask image. This device is a different approach to contrast enhancement that is distinguished from previous methods by eliminating the need for an extra layer of contrast enhancement on top of the resist, thereby reducing the number of processing steps in semiconductor fabrication.