The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2003
Filed:
Mar. 30, 2000
Applicant:
Inventor:
Klaus Brunwinkel, Göttingen, DE;
Assignee:
Microlas Lasersystem GmbH, Goettingen, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 2/606 ;
U.S. Cl.
CPC ...
B23K 2/606 ;
Abstract
An apparatus and a method for controlling the intensity distribution of a laser beam for processing a substrate provide that the laser radiation passes a homogenizing device, subsequent to which partial beams of the laser beam superimpose one another so that a homogenization of the intensity distribution of the laser beam is achieved. By arrangement of a diaphragm at a position in the radiation path of the laser beam, radiation is cut out off the partial beams superimposing one another in such a way that varied portions of at least some of the partial beams are cut out.