The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 15, 2003

Filed:

May. 13, 2002
Applicant:
Inventors:

Katsunori Suzuki, Tochigi, JP;

Hidetaka Horiuchi, Tochigi, JP;

Yasushi Kikuchi, Tochigi, JP;

Jin Yokogawa, Tochigi, JP;

Ryouichi Kubo, Tochigi, JP;

Koji Wakabayashi, Tochigi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 1/00 ; C23C 1/600 ; H01L 2/00 ;
U.S. Cl.
CPC ...
H05H 1/00 ; C23C 1/600 ; H01L 2/00 ;
Abstract

Apparatus and methods for producing semiconductor devices are disclosed. A processing chamber includes an interior component having a stepped region including a plurality of raised sections and recessed sections divided by steps. With this apparatus, it is possible to prevent a film of deposited material formed on the stepped region from peeling thereby decreasing the number of particles in the chamber and increasing the operation rate.


Find Patent Forward Citations

Loading…