The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2003
Filed:
Oct. 05, 2000
Applicant:
Inventor:
Fu Zhang, Austin, TX (US);
Assignee:
Momentum Technical Consulting Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 ;
U.S. Cl.
CPC ...
B24B 1/00 ;
Abstract
A device ( ) and method for detecting endpoints (Ep , Ep ) of a chemical-mechanical polishing (CMP) process for semiconductor wafers ( ). A carrier current signal driving a polishing carrier motor is received and detected, the carrier current signal is modified, and the modified carrier current is analyzed to detect at least one endpoint of the polishing process. The device ( ) includes a detector ( ), a logic circuit ( ) and storage ( ).
Zhang, Fu. (2003). Chemical/mechanical polishing endpoint detection device and method (U.S. Patent No. 6547637). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6547637
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile