The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2003
Filed:
Apr. 12, 2000
Applicant:
Inventors:
Narihiro Morosawa, Nara-ken, JP;
Hiroshi Iwata, Nara-ken, JP;
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/782 ;
U.S. Cl.
CPC ...
H01L 2/782 ;
Abstract
A semiconductor device includes an insulating gate field effect transistor including a gate electrode, wherein the gate electrode includes a polycrystalline semiconductor film having a crystal defect density of about 1×10 cm or less. In certain embodiments, the polycrystalline semiconductor film may be oxidation thermally annealed by subjecting the polycrystalline semiconductor film to thermal treatment in an oxidation atmosphere to carry out oxidization of the polycrystalline semiconductor film and activation of impurities simultaneously.