The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 08, 2003

Filed:

Dec. 19, 2000
Applicant:
Inventor:

Shinya Kamimura, Kitakatsuragi-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/978 ; H01L 3/308 ;
U.S. Cl.
CPC ...
H01L 2/978 ; H01L 3/308 ;
Abstract

A horizontal transfer section is formed on a P-type semiconductor substrate. A floating diffusion layer for receiving signal charges from the horizontal transfer section and a detector MOSFET for detecting any potential change of the floating diffusion layer are further formed. This detector MOSFET has a gate electrode in which an opening is formed. The gate electrode extends toward the floating diffusion layer and the opening is positioned above the floating diffusion layer. As a result, a solid-state image sensor constituted as above, can reduce the area of the floating diffusion layer and can detect signal charges at high sensitivity.


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Kamimura, Shinya. (2003). Solid-state image sensor and manufacturing method therefor (U.S. Patent No. 6545301). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6545301

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