The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2003
Filed:
Jul. 05, 2000
Takashi Masuyuki, Tokyo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
The invention provides a face position detection method and a face position detection apparatus which can perform detection of the face position of a substrate with high precision, even when a pattern having a large stepped portion is formed by means of a plurality of layers on the surface of the substrate, and an exposure method and an exposure apparatus. Measurement beams S to S are irradiated onto a plurality of places on the surface of a substrate (object) W using a beam irradiation system (irradiation system) , the plurality of measurement beams S to S from the surface of the substrate W are then detected using a beam reception system (detection system) , and face positional information for the surface of the substrate W is obtained based on the detection results for the plurality of measurement beams S to S using a signal processing unit . With at least one measurement beam S of the plurality of measurement beams, at least either one of the shape and size thereof on the surface of the substrate W is set to be smaller than at least either one of the shape and size of the other measurement beams S to S on the surface of the substrate W.