The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2003
Filed:
Aug. 17, 2000
Applicant:
Inventors:
Ghenwa Bouhadir, Gif sur Yvette, FR;
Dominique Charmot, Los Gatos, CA (US);
Pascale Corpart, Sannois, FR;
Samir Zard, Gif sur Yvette, FR;
Assignee:
Rhodia Chimie, Courbevoie Cedex, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
C08F / ;
Abstract
The invention concerns a method for preparing, by radical polymerisation, block polymers of general formula (1), which consists in contacting: an ethylenically unsaturated monomer of formula CYY′(═CW—CW′) ═CH : and a precursor compound of general formula (II): a radical polymerization initiator.
Bouhadir, Ghenwa. (2003). Synthesis method for block polymers by controlled radical polymerization from dithioester compounds (U.S. Patent No. 6545098). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6545098
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile