The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2003
Filed:
Dec. 13, 1999
Applicant:
Inventor:
Shinji Kobayashi, Nara, JP;
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ; H01L 2/13065 ; H01L 2/1308 ; C23F 1/00 ;
U.S. Cl.
CPC ...
H01L 2/1302 ; H01L 2/13065 ; H01L 2/1308 ; C23F 1/00 ;
Abstract
A method of producing a chromium mask, said method comprising forming a chromium film on a mask substrate, forming a resist layer on the chromium film, patterning the resist layer in desired shape, performing plasma treatment with a fluorine-containing gas on the resist pattern, and finally performing dry etching on the chromium film by using the resist pattern as a mask.