The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 08, 2003

Filed:

Mar. 14, 2000
Applicant:
Inventor:

David M. Inori, Napa, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 5/334 ; B01D 5/374 ; F23J 3/02 ; B08B 9/027 ;
U.S. Cl.
CPC ...
B01D 5/334 ; B01D 5/374 ; F23J 3/02 ; B08B 9/027 ;
Abstract

The present invention provides a reaction chamber cleaning apparatus comprising a chamber, a blade apparatus comprising at least one annular mounting member, at least four scraping blades attached peripherally about the annular mounting member, and a reciprocal movement unit for rotating said scraping blade(s) circumferentially back and forth along the interior surface of said chamber to scrape the interior surface of said chamber; said reaction chamber cleaning apparatus also comprising a vortex unit comprising a generally conical outer shell attached to and extending downwardly from the top plate top plate, and a liquid inlet arranged in relation to the outer shell to tangentially introduce liquid into the outer shell, thereby forming a laminar sheet of fluid on the inner surface of the outer shell; said vortex unit further comprising a baffle and a concentric chamber bounded by the outer surface of the baffle, the inner surface of the outer shell, and the bottom surface of the top plate. The invention also includes methods for using the reaction chamber for effluent abatement.


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