The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2003
Filed:
Mar. 24, 2000
Toshihiro Kikuchi, Miyagi-ken, JP;
Yoshihiro Someno, Miyagi-ken, JP;
Toshio Hirai, Miyagi-ken, JP;
Yoshiyuki Kawazoe, Miyagi-ken, JP;
Hiroshi Mizuseki, Miyagi-ken, JP;
Alps Electric Co., Ltd., Tokyo, JP;
Abstract
A method of producing multilayered optical filters by using a genetic algorithm that determines an optimal combination of refractive indexes and thicknesses for each layer of the filter is described. The method generates initial values for the component and places the values within a matrix P, where P=(X , X , X , . . . , Xi, . . . , Xs) and Xi is an elementary matrix that includes the refractive index and thickness of each layer i. The method may generate mutated patterns by increasing or decreasing the thicknesses and refractive indexes of the initial pattern. It may also perform a cross-over process, selecting patterns from grouping of mutated patterns. Alternately, the method may perform a process where selected patterns having optical characteristics closest to the desired characteristics from the initial, mutated or crossover patters are chosen. The genetic algorithm utilizing the above processes repeats until the optical characteristics fall within the desired range.