The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2003
Filed:
Jan. 28, 2000
Robert G. Batchko, Stanford, CA (US);
Gregory D. Miller, Foster City, CA (US);
Robert L. Byer, Stanford, CA (US);
Vladimir Shur, Ekaterinburg, RU;
Martin M. Fejer, Menlo Park, CA (US);
The Board of Trustees of the Leland Stanford Junior University, Stanford, CA (US);
Abstract
A method for fabricating periodically poled structures. The method produces an electric field within a ferroelectric substrate by applying a voltage waveform to an electrode structure disposed on a surface of the substrate. The waveform raises the electric field magnitude to a level substantially greater than that required to reverse domains within the substrate. Domain reversal continues through to completion at which time the poling field is turned off or substantially reduced to induce spontaneous backswitch poling. The forward poling field is then reapplied to stop the backswitch poling. The ability to selectively enable and terminate backswitching allows for the formation of domain patterns with small feature sizes and high uniformity through large volumes of material.