The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2003
Filed:
Mar. 21, 2001
Tihiro Ohkawa, La Jolla, CA (US);
Archimedes Technology Group, Inc., San Diego, CA (US);
Abstract
A plasma mass filter for separating low-mass particles from high-mass particles in a multi-species plasma includes a substantially cylindrically shaped barrier surrounding a chamber and defining a longitudinal axis. Helically shaped coils are mounted on the barrier to establish a magnetic field in the chamber. Conducting rings are provided to establish a radially directed electric field in the chamber. The plasma is injected into the chamber for interaction with the electric and magnetic fields, placing the high-mass particles onto trajectories rotating about a guiding center that travels within a surface having a hyperbolic shape. The low-mass particles are placed onto trajectories rotating about a guiding center that travels within a surface having an elliptical shape. The fields create an axial force directing the particles away from the injection point. As such, the high-mass particles strike the inner wall of the barrier, while the low-mass particles transit through the chamber.