The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 01, 2003

Filed:

Aug. 30, 2000
Applicant:
Inventors:

Wolfgang Holzapfel, Obing, DE;

Walter Huber, Traunstein, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01D 5/34 ;
U.S. Cl.
CPC ...
G01D 5/34 ;
Abstract

An optical position measuring system that includes a light source, a measuring graduation, a scanning unit movable relative to the measuring graduation in at least one measurement direction. A projection graduation has periodic amplitude and phase structures disposed in alternation in the measurement direction. The arrangement further includes a detection graduation and a plurality of optoelectronic detector elements, wherein light from the light source interacts with the projection graduation so as to project a fringe pattern onto the detection graduation, so that via the plurality of optoelectronic detector elements, displacement-dependent output signals are detectable, and wherein the projection graduation has a structure such that in addition to even orders of diffraction and the zero order of diffraction, at least some of the (2n+1)th orders of diffraction are suppressed, where n=1, 2, 3, . . . , as a result of which essentially only the ±1st orders of diffraction contribute to generating the output signals.


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