The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 01, 2003

Filed:

Dec. 02, 1999
Applicant:
Inventors:

Aleksander J. Franz, Winchester, MA (US);

Klavs F. Jensen, Lexington, MA (US);

Martin A. Schmidt, Reading, MA (US);

Samara Firebaugh, Cambridge, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 5/00 ; C07C 5/327 ; H01M 8/18 ; B01D 5/322 ; C01B 3/02 ; C01B 3/26 ;
U.S. Cl.
CPC ...
C07C 5/00 ; C07C 5/327 ; H01M 8/18 ; B01D 5/322 ; C01B 3/02 ; C01B 3/26 ;
Abstract

The present invention relates to gas separation membranes including a metal-based layer having sub-micron scale thicknesses. The metal-based layer can be a palladium alloy supported by ceramic layers such as a silicon oxide layer and a silicon nitride layer. By using MEMS, a series of perforations (holes) can be patterned to allow chemical components to access both sides of the metal-based layer. Heaters and temperature sensing devices can also be patterned on the membrane. The present invention also relates to a portable power generation system at a chemical microreactor comprising the gas separation membrane. The invention is also directed to a method for fabricating a gas separation membrane. Due to the ability to make chemical microreactors of very small sizes, a series of reactors can be used in combination on a silicon surface to produce an integrated gas membrane device.


Find Patent Forward Citations

Loading…