The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2003
Filed:
Jan. 17, 2002
Applicant:
Inventor:
Xiaochun Linda Chen, Hopewell Junction, NY (US);
Assignee:
Infineon Technologies AG, , DE;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ;
U.S. Cl.
CPC ...
H01L 2/1302 ;
Abstract
A resist layer is deposited atop a substrate and is patterned to expose portions of a substrate. A hardmask layer is deposited atop the patterned resist layer and atop the exposed portions of the substrate. The patterned resist layer is removed so that only a portion of the hardmask layer that is atop the substrate remains.
Chen, Xiaochun. (2003). Process for implementation of a hardmask (U.S. Patent No. 6541387). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6541387
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile