The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2003
Filed:
Aug. 22, 2001
Applicant:
Inventors:
Young Hee Kim, Daejeon, KR;
Yong-Ki Park, Daejeon, KR;
Assignee:
Korea Research Institute of Chemical Technology, Daejeon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/144 ; H01L 2/1302 ;
U.S. Cl.
CPC ...
H01L 2/144 ; H01L 2/1302 ;
Abstract
The present invention relates to a method and an apparatus for preparing polysilicon, more specifically to a method and an apparatus for preparing polysilicon in granule form by equipping a fluidized bed reactor with a nozzle that provides an etching gas including hydrogen chloride in order to effectively prevent silicon from depositing on the outlet surfaces of the reaction gas supplying means and to be able to operate the reactor continuously in the bulk production of polysilicon granules.