The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 01, 2003

Filed:

Jul. 14, 2000
Applicant:
Inventors:

Jyh-Shuey (Jerry) Lo, San Jose, CA (US);

John I. Kim, San Jose, CA (US);

Timothy J. Moran, San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 5/127 ; H04R 3/100 ;
U.S. Cl.
CPC ...
G11B 5/127 ; H04R 3/100 ;
Abstract

A high throughput method for producing the narrow track width inductive head is also provided, whereby the heads may be manufactured in substantial volumes. The new head may be merged or piggy-backed MR or GMR heads, comprising a first pole piece, P , and a second pole piece, P , and is distinctly characterized by write track width is significantly reduced by a preliminary ion milling process before P notching is performed. The preliminary step utilizes an ion milling process to trim the write track width, P B, at an angle between 45 to 85 degrees from the wafer normal. The MR head may then undergo conventional P notching.


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