The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2003
Filed:
Oct. 02, 2000
Applicant:
Inventors:
Nobutaka Fujimori, Fujisawa, JP;
Manabu Toguchi, Kawasaki, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/742 ; G03B 2/754 ;
U.S. Cl.
CPC ...
G03B 2/742 ; G03B 2/754 ;
Abstract
Disclosed is an exposure apparatus designed to expose the pattern of a mask through a projection optical system on a substrate by using an exposure light. This exposure apparatus comprises a line width detector for detecting the pattern line width of the mask, and a control unit for controlling the light exposure of the exposure light based on the detecting result of the line width detector. Thus, exposure is easily carried out on the substrate without any line width differences even if a plurality of masks are used.