The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2003
Filed:
Dec. 28, 2001
Kazunobu Ohkubo, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
The present invention provides an exposure device in which availability of the emitted light is high, optical crosstalk is reduced, and an image can be formed at high resolution. Concave microlenses are formed on one surface of the exposure device facing a photosensitive material, and organic EL elements are formed on the other surface. The organic EL elements are disposed at some of portions at which anode lines and cathode lines intersect each other. A diameter D of an aperture of the microlens is n times an array pitch p of each organic EL element, n lines of the cathode lines are formed, and the organic EL elements arranged on one cathode line are shifted from those on another cathode line in a main-scanning direction by the array pitch p. Accordingly, exposure spots, which are exposed by the organic EL elements incorporated in the n lines of the cathode lines, are offset without overlapping one another, and the entire photosensitive material can be exposed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile