The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 25, 2003

Filed:

Jul. 05, 2000
Applicant:
Inventors:

Hisao Yasuhara, Chiba, JP;

Makoto Shimura, Chiba, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 3/300 ;
U.S. Cl.
CPC ...
G01N 3/300 ;
Abstract

Free fluorine is measured in a hydrofluoric acid-containing solution with a coexistent metallic ion based on a total fluorine concentration, a total acid concentration, a metallic ion concentration, the equilibrium constant of hydrofluoric acid, and equilibrium constants of metal fluoride complexes. It is possible to accurately analyze free fluorine in a hydrofluoric acid-containing solution without being affected by a coexistent metal and by the passage of time. This technique may be used to accurately control the concentration of free fluorine in a hydrofluoric acid-containing mixed acid pickling solution at the production site of a stainless steel so that improvement in descaling capability as well as reduction in the amount of chemical materials can be achieved.


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