The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2003
Filed:
Jan. 05, 2000
Christopher David McCullough, Fort Collins, CO (US);
Kevin Barry Ray, Ft. Collins, CO (US);
Alan Stanley Victor Monk, Warrington, GB;
Stuart Bayes, Leeds, GB;
Mark John Spowage, Leeds, GB;
Kodak Polychrome Graphics LLC, Norwalk, CT (US);
Abstract
The invention is directed to a method for producing a predetermined resist pattern on a substrate. The method includes the patternwise application of infrared radiation to a precursor which contains the substrate, having a coating thereon, wherein the coating contains a positive working composition; and the development of the pattern using a developer. The composition contains a polymeric substance having functional groups Q thereon, such that the functionalized polymeric substance has the property that it is developer insoluble prior to delivery of infrared radiation and developer soluble thereafter.