The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2003
Filed:
May. 14, 1998
Applicant:
Inventors:
John H. Detrick, Birmingham, AL (US);
Frederick T. Carney, Jr., Sylacauga, AL (US);
Assignee:
RLC Technologies, L.L.C., Sylacauga, AL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 7/00 ; B05D 3/12 ;
U.S. Cl.
CPC ...
B05D 7/00 ; B05D 3/12 ;
Abstract
A machine system and process for producing attrition resistant, controlled release fertilizer is described. In the process, a prewet solution is used to initially coat the plant nutrient to be coated followed by the separate application of the individual components used in the coating. The machine system provides an improved means for uniformly applying a single layer or multiple layers of polymer coatings to the plant nutrient.
Detrick, John. (2003). Machine system and process for producing attrition resistant slow release fertilizers (U.S. Patent No. 6537611). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6537611
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile