The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2003
Filed:
Aug. 23, 1999
Richard J. Adler, Albuquerque, NM (US);
Other;
Abstract
An electron beam as a curing technique with dynamic beam control technology in order to produce arbitrarily shaped parts. The result of this is equipment which can create prototypes and parts rapidly without additional tooling. The electron beam from a low divergence gun is accelerated towards uncured monomer in vacuum. Deflection of the beam combined with a grid which is used to turn the beam on and off, creates a two dimensional curing path with a depth of approximately five (5) thousandths of inch. Successive layers of this type, built up as monomer is added, creates a three dimensional pattern. The layers can either be of uniform thickness, or can be varied in thickness by varying the energy of the beam.