The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2003
Filed:
May. 23, 2001
Applicant:
Inventor:
Shumpei Tatsumi, Yokohama, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 1/10 ;
U.S. Cl.
CPC ...
G02B 1/10 ;
Abstract
A high reflection mirror has a layer structure comprising on a substrate, a TiO layer, an Ag layer, an Al O layer and a TiO layer in this order, or alternatively on a substrate, an SiO layer, a Cr layer, an Ag layer, an Al O layer and a TiO layer in this order (1≦x≦2). An SiO protective layer may be formed on the top TiO layer (1≦y≦2). The high reflection mirror shows a high reflectance and a high durability and can be produced at a lower cost because of the reduced number of layers.
Tatsumi, Shumpei. (2003). High reflection mirror (U.S. Patent No. 6535336). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6535336
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile