The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2003
Filed:
Jan. 03, 2002
Jae Young Ahn, Seongnam-si, KR;
Woo Sung Lee, Yongin-si, KR;
Man Sug Kang, Yongin-si, KR;
Hee Seok Kim, Yongin-si, KR;
Abstract
Disclosed is a method for depositing a tungsten silicide layer on a wafer coated with a polysilicon layer in a CVD process chamber. A surface of the polysilicon layer is pre-treated by introducing a hydrogen compound gas including any elements among group III elements or group V elements of the periodic table into the CVD process chamber. The tungsten silicide layer is deposited on the polysilicon layer by introducing a silane source gas and a tungsten source gas into the CVD process chamber. Since the surface of the polysilicon layer is pre-treated using the hydrogen compound gas before the tungsten silicide layer is deposited on the polysilicon layer, void generation is prevented on an interfacial surface between the tungsten silicide layer and the polysilicon layer.